Press release from Business Wire
Mentor Graphics Announces Comprehensive Design Enablement Platform for Samsung's 14nm IC Manufacturing Process
Friday, December 21, 2012
Mentor Graphics Announces Comprehensive Design Enablement Platform for Samsung's 14nm IC Manufacturing Process09:00 EST Friday, December 21, 2012
WILSONVILLE, Ore. (Business Wire) -- Mentor
Graphics Corp. (NASDAQ: MENT) today announced comprehensive design,
manufacturing, and post tapeout enabling support for Samsung's 14nm IC
manufacturing processes, providing customers with a complete
design-to-silicon flow concurrent with early process availability. The
fully interoperable Mentor® flow helps customers achieve fast design
cycles and first time silicon success.
The Mentor solutions optimized for Samsung's 14nm offerings include the
Calibre® platform with design rule checking (DRC), LVS checking,
extraction, design for manufacturing (DFM) and advanced fill, as well as
the Tessent® design for test (DFT) suite and yield analysis tools.
“Samsung and Mentor have been working together to speed the enablement
of design and manufacturing co-optimization for many years, and our
collaboration is more important than ever at the 14nm node,” said Dr.
Kyu-Myung Choi, senior vice president of System LSI infrastructure
design center, Device Solutions, Samsung Electronics. “The design rules
for 14nm are extremely complex with the introduction of FinFETs in
addition to double patterning (DP) layers. It is critical that physical
design, verification and testing tools are intimately aligned with the
manufacturing processes of the target foundry. Since Samsung also uses
the Mentor Calibre solution for its own IC development, designers using
it will get accurate and immediate feedback so they can co-optimize the
design process.”
The Calibre platform creates decomposed double patterning (DP) layouts
that are compliant with all of Samsung's 14nm lithography requirements
and tuned to the Samsung mask synthesis and OPC process, which is also
provided by Mentor at 14nm. It also provides designers with rapid
feedback on complex design rules for FinFETs, and specific coaching on
elimination of DFM litho errors to make fixing violations faster and
more accurate. Calibre tools for LVS and extraction have been calibrated
to ensure accurate device and parasitic models for Samsung FinFETs,
eliminating “double-counting” of important effects that can occur with
other tools. Moreover, Calibre SmartFill ensures there are no CMP issues
with designs by intelligently placing fill structures to achieve
planarity while minimizing timing issues.
Collaboration on Tessent cell-aware test tools is providing higher test
quality for new cell internal structures at 14nm, and higher test
pattern compression to control the cost of testing larger 14nm designs.
Mentor and Samsung are also leveraging production test diagnosis by
exchanging information between the Tessent tools and the Calibre Pattern
Matching facility to quickly identify and eliminate design-specific
yield limiting features during design ramp up.
“Through our close cooperation, Mentor and Samsung are able to provide
all the necessary enabling technology for our customers concurrent with
the availability of Samsung's 14nm manufacturing processes,” said Joseph
Sawicki, vice president and general manager of the Design to Silicon
division at Mentor Graphics. “This level of collaboration is absolutely
necessary to deliver a 14nm-ready design ecosystem.”
About Mentor Graphics
Mentor Graphics Corporation is a world leader in electronic hardware and
software design solutions, providing products, consulting services and
award-winning support for the world's most successful electronic,
semiconductor and systems companies. Established in 1981, the company
reported revenues in the last fiscal year of about $1,015 million.
Corporate headquarters are located at 8005 S.W. Boeckman Road,
Wilsonville, Oregon 97070-7777. World Wide Web site: http://www.mentor.com.
(Mentor Graphics, Mentor, Calibre and Tessent are registered trademarks
of Mentor Graphics Corporation. All other company or product names are
the registered trademarks or trademarks of their respective owners.)
Mentor GraphicsGene Forte, 503-685-1193gene_forte@mentor.comorSonia
Harrison, 503-685-1165sonia_harrison@mentor.com
